PN Junction Semiconductor (Zhejiang) Co., Ltd.

PNJ Semiconductor, founded in September 2018, is a third-generation semiconductor company focused on “technology-driven innovation and market leadership.” Specializing in high-performance, highly reliable power electronic solutions, the company serves key industries such as energy and AI. With cutting-edge expertise in 3.2 μm ultra-small cell design and ultra-high-reliability SiC chip technology, PNJ Semiconductor has developed a comprehensive product portfolio. This includes automotive-grade SiC MOSFETs, SiC Schottky Barrier Diodes (SBDs), SiC modules, and GaN power devices, covering a voltage range from 650V to 3300V, with more than 100 distinct product types. PNJ’s self-developed SiC MOSFETs have achieved mass production and are now installed in over 5 million vehicles, with a zero PPM failure rate. These products are widely deployed across various high-demand applications, such as in domestic electric vehicles, Tier-1 suppliers, AI computing power supplies, energy storage systems, charging stations, micro photovoltaic inverters, and low-altitude aircraft.

Product 1
Development technology/material/manufacturing process name

Automotive SiC HPD Module

Innovation Highlights

? 4.2 kV DC 1 sec Insulation ? High Creepage and Clearance Distances ? Compact design ? High Power Density ? Direct Cooled PinFin Base Plate ? High Performance Si3N4 Ceramic ? Guiding elements for PCB and cooler assembly ? Integrated NTC temperature sensor ? PressFIT Contact Technology ? Sliver Sintering Technology ? Cu Clip Bonding ? SiC 750V/1200V/1500V

Development phase

量产

Applications

Electric Drive

Photo of exhibits recommended

Product 1
Development technology/material/manufacturing process name

8-inch SiC MOSFET Wafer

Innovation Highlights

? Higher Wafer Utilization The single-wafer area has increased by 77%, enabling an 87% increase in the number of Dies Per Wafer. This significantly improves production capacity while reducing unit cost. ? Improved Performance Consistency The larger wafer size can significantly minimize edge effects, improve parameter consistency and manufacturing yield rate ? Compatibility with More Advanced Process Technologies Upgradable to more advanced lithography and manufacturing processes, improving process tolerance and manufacturability.

Development phase

小批量

Applications

electric drive

Photo of exhibits recommended

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